Advanced Design System (ADS) 2009 license ecc crack

Advanced Design System (ADS) is a powerful electronic design automation software system. It offers complete design integration to designers of products such as cellular and portable phones, pagers, wireless networks, radar and satellite communications systems, and high-speed digital serial links.

Advanced Design System is the industry leader in high-frequency design. It supports system and RF design engineers developing all types of RF designs, from simple to the most complex, from RF/microwave modules to integrated MMICs for communications and aerospace/defense applications.

With a complete set of simulation technologies ranging from frequency-, time-, numeric and physical domain simulation to electromagnetic field simulation, ADS lets designers fully characterize and optimize designs. The single, integrated design environment provides system, circuit, and electromagnetic simulators, along with schematic capture, layout, and verification capability -- eliminating the stops and starts associated with changing design tools in mid-cycle.

Use ADS and its highly integrated links and support as a basis for your design verification solution. ADS can be used for virtual prototyping, debugging, or as an aid in manufacturing test. To enhance engineering productivity and shorten time-to-market, ADS software offers a high level of design automation and applications intelligence. This proven software environment is easily extensible: you can customize ADS by adding features focused on your particular application needs. ADS runs on PCs and workstations, with complete file compatibility between platforms and across networks.
Fixed Issues in ADS 2009
EMDS Fixed Issues
Many issues were addressed in the EMDS mesher and solver area resulting in greatly improved robustness of the EMDS solution as a whole. Usability improvements were implemented in the 3D viewer and visualization solution.
Installation Fixed Issues
ADS startup script can now co-exist with LSF setup scripts without any conflict.
Design Environment Fixed Issues
Many quality problems were fixed in the areas of editing, boolean operations, design synchronization, layout connectivity and the component library browser.
The Enter key on the numeric key pad is working the same as the Enter key on the regular keyboard.
The customed hotkey definition with ALT key combination is now taking precedence over the default hotkey definiton of the same combination.
Data Display
You can now change the size and symbol of markers, as well as the marker readout content, to better improve the readability of a Data Display page.
Copy/Paste menu sensitivity behaves consistently across multiple Data Display windows.
The performance degradation observed after hours of zoom in, zoom out, view change operations in Data Display has been eliminated.
Analog/RF Simulation Fixed Issues

ChemStations ChemCAD V6.1.2.2616

Changes for CHEMCAD Release 6.1.2.2616

CHEMCAD New Features and Enhancements

Added the capability to send multiple feed streams to the same tray for UnitOp types SCDS, TOWR, and TPLS (1626)
Added an option to use Notepad or WordPad instead of the integrated CHEMCAD report viewer (1798)
Added user-defined transport property functions for streams (274)
Added the capability to create user-added mixing rules (example available on request) (702)
Increased to 10 the number of components that can be used in an electrolyte regression (827)
Added new options to the Stream Property report (10%/90%) (841)
Added new stream properties for various distillation curve cut temperatures, useful for feedback controllers (913)
Implemented a check for the potential for two liquid phases throughout the simulation (1019)
Added the capability to click on stream and UnitOp labels for editing (1026)
Added a user-controllable AutoRecovery feature, which can help minimize lost work in the event that CHEMCAD closes unexpectedly (1035)
Added options for specifying tank volume as a function of height (1197)
Added new materials to the CC-THERM database (duplex S31802/S32205) (1265)
Added the capability to perform a text search in a CHEMCAD report tab using the [CTRL-F] key combination (1623)
Added the capability to e-mail an open simulation in its present saved state (1639)
Enhanced the Update Components dialog box to include property units (1644)
Added the Close All Charts and Close All Reports options to the Window menu (1649)
Improved the phase envelope plot for simulations in which bubble temperature and dew point temperature fail to converge (1668)

Rms roxar 2009 license crack

With a brand new user interface, RMS2009 has been redesigned for the next decade of innovation and excellence. Driven by customer feedback, RMS2009 allows users to produce accurate results more quickly with the breakthrough structural modelling and local model update modules. Flexible data transfer and the powerful workflow manager tool have further strengthened the usability of the E&Ps industries premier solution for integrated static and dynamic reservoir modelling.
Roxar's integrated Irap RMS Solution can help accelerate the field development planning cycle by allowing multiple disciplines to work together on a common reservoir model in parallel. The capability to build reliable reservoir models in a collaborative environment also assists in increasing the ultimate recovery.

Roxar appreciates that the biggest challenge the exploration and production industry faces is the industry wide skills shortage with maturing and more difficult to develop hydrocarbon assets.

Roxar’s Irap RMS breaks down the barriers between geoscientists and engineers, resulting in better decisions through a shared understanding of the reservoir. Integrated workflows deliver team productivity improvements whilst also capturing valuable knowledge about the reservoir.

Irap RMS is the E&P industries premier solution for integrated static and dynamic reservoir modelling. It comprises of a range of linked modules, each covering a specific stage of the complete reservoir characterization, development and production optimisation workflow.

Integrate Reservoir Knowledge

Breaking down the traditional barriers between technical domains Irap RMS enables the building of a shared earth model. This ensures that the expertise and knowledge of the full team can used to build the most accurate reservoir model for planning and decision making.

Reduce Risk and Manage Uncertainty

Irap RMS makes it easy to generate multiple scenarios for the analysis of uncertainty across both the static and dynamic reservoir model. The ability to easily quantify the risks helps optimise the field development planning process and technical decision making. This ultimately leads to an improved project return on investment.

Produce Accurate Results Quickly

With field development decisions which cost tens of millions of dollars it is critical to ensure that decisions are being made on accurate, up to date models which honour as much of the field data as possible. Irap RMS leads the industry in the integration of different data into the reservoir model. Workflow tools also ensure that models can be updated immediately when new data becomes available.

Essential Macleod v8.18 key

The Essential Macleod is a comprehensive software package for the design and analysis of optical thin films. It runs under any 32 bit Microsoft Windows operating system and has a true multiple document interface. It provides all you need for optical coating design and evaluation including WDM and DWDM filters, handling a wide range of performance parameters from ultrafast to color. It can synthesize designs from scratch or refine existing ones, investigate errors and extract optical constants of film materials for use in designs
Easy to use, familiar Windows look and feel
Comprehensive Performance Calculations
User-defined Units
Design Refinement
Design Synthesis
Index Refinement
n and k derivation
Tolerancing
Color calculations
Materials Management
Full Support Service
Ultrafast Parameters
Adaptive Plotting
Design & Analysis Tools
Publication Quality Graphics
Export Designs to ZEMAX
Readily Extensible via Macleod Enhancements


Features



Easy to Use

Familiar User Interface
Extensive use of Clipboard
Publication quality graphs
True Multiple Document Interface
Powerful Tools to support all editing processes
User-Defined Units

Arbitrary units for
Wavelength
Frequency
Thickness
Time
Reverse Engineering

n and k extraction
Inhomogeneity and absorption
Packing density variation
Common scaling
Flexibly constrained refinement
Refinement and Synthesis

Optimac
Simplex
Simulated Annealing
Targets

May be specified for all parameters including color
Import target data from external sources
Linking
Analysis and Design Tools

Admittance diagrams
Reflection coefficient diagrams
Absolute electric field amplitude plots
Induced transmission filter design tool
Non-polarizing edge filter design tool
Equivalent layer (Herpin) calculations
Performance Calculations

Reflectance
Transmittance
Reflectance Phase
Transmittance Phase
Density
Psi
Delta
Group Delay
Group Delay Dispersion
Third Order Dispersion
First, second and third derivatives
Tolerancing as a function of:
Wavelength
Frequency
Incident Angle
Layer Thickness
Color

Calculations in the following systems
Tristimulus
Chromaticity
CIE L*a*b*
CIE L*u*v*
Hunter Lab
User-definable sources
User-definable observers
Materials

Common materials supplied as standard
Multiple databases - for example:
Different temperature
Coating machine
Separate for each project
Different clients
Different systems of units
Materials data easily imported
Graphical display of data
Powerful editors

Mentor Graphics Catapult C Synthesis 2008 license crack

Mentor Graphics Corporation (Nasdaq: MENT) announced that Fujitsu Limited has adopted the Catapult® C Synthesis tool to its standard ASIC (application specific integrated circuit) design kit. A number of electronic system level (ESL) synthesis tools were assessed in order to meet Fujitsu’s stringent requirements for quality standards. As a result, the Catapult C Synthesis tool was selected after exhaustive tests, and deployed for current design projects, which include two tapeouts in the last few months.
Mentor offers total support for an electronic system level (ESL) hardware design solution. Catapult C Synthesis inputs pure ANSI C++ code and automatically generates RTL targeted to FPGA or ASIC technologies. Pioneer's designers report that the Catapult C Synthesis tool helps them achieve optimal architecture and create the best implementation in terms of latency, power consumption and size. For verification, Pioneer's designers can use the Catapult C tool's SystemC verification extension, which allows them to reuse the original C++ testbench to run RTL simulation using Mentor Graphics' ModelSim{reg} verification tool. By using Mentor's FPGA logic synthesis tool, Precision RTL Synthesis, Pioneer engineers can create an FPGA implementation without timing violation and also verify and measure performance of the final implementation.
Mentor Graphics Corporation (Nasdaq:MENT) today announced its Catapult(TM) C Synthesis product, the only algorithmic synthesis tool that uses pure, untimed C++ to create quality register transfer level (RTL) descriptions up to 20 times faster than traditional manual methods. With the Catapult C Synthesis tool, hardware designers can significantly reduce RTL implementation time, improve design flow reliability and shrink hardware size. The Catapult C Synthesis tool targets designers developing application-specific integrated circuits (ASICs) or field-programmable gate arrays (FPGAs) for next-generation, compute-intensive applications such as wireless communication, satellite communication and video/image processing.

By uniting system-level and hardware design, the Catapult C Synthesis tool combines with the Mentor Graphics(R) ModelSim(R) simulator to create the central foundation for a C-based design flow.

optisworks 2009 license key crack

Toulon, France, 28 January 2009 – OPTIS, the leading software developer for the scientific simulation of light, has announced that the functionality of its 3D Textures package has been integrated into OptisWorks, which is the SolidWorks add-in version of OPTIS’s SPEOS software. 3D Textures For OptisWorks was released in January 2009.

What's New in OPTIS Labs 2009


Compatibility
Windows 2000 is no more supported.

64 bits version.

New functionalities
Virtual Photometric Lab & Virtual Human Vision Lab: Sun Glasses colored filter.

Virtual Photometric Lab & Virtual Human Vision Lab: Night Vision Goggles.

3D view tool.

Improvements
BSDF - BRDF Viewer: Display of the total reflection and/or transmission coefficients.

Fixed bugs
Virtual Photometric Lab and Virtual Human Vision Labs: The Print view closure using the top-right cross.
Accuracy of a XMP map which is a conoscopic intensity result.
An error message added when opening an empty Ray File with the Ray File Editor.
Automation
New Virtual Photometric Lab API:

NightVisionGoggles
SpectralFiltering
GetPrecision



New Virtual Human Vision Lab API:

Animation: AnimationLocalAdaptation and AnimationTimeAdaptation
GetDepth
NightVisionGoggles
SpectralFiltering
XNb YNb

Licensing
New Radiometry-Defense Lab (LAB_VE4).

Vision Goggles is granted by VE4 (SPEOS CAA V5 Based) and SVE4 (SPEOS Visual Ergonomics).

Sun Glasses colored filter is granted by VE3 (SPEOS CAA V5 Based), SVE3 (SPEOS Visual Ergonomics) and LAB_VE3 (OPTIS Labs).


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PVTsim 18.0 license crack

PVTsim 18
PVTsim is a versatile PVT simulation program developed for reservoir engineers, flow assurance specialists, PVT lab engineers and process engineers.

The PVT simulation package PVTsim is being used by leading oil producing and operating companies throughout the world.

Based on an extensive data material collected over a period of more than 20 years, PVTsim carries the information from experimental PVT studies into simulation software in a consistent manner and without loosing valuable information on the way.

PVTsim 18 allows reservoir engineers, flow assurance specialists and process engineers to combine reliable fluid characterization procedures with robust and efficient regression algorithms to match fluid properties and experimental data. The fluid parameters may be exported to produce high quality input data for reservoir, pipeline and process simulators.

PVTsim 18 is petroleum phase behavior at the tip of your fingers.
PVT & Regression
MMP algorithm enhanced (especially for CO2 injection gas). More informative error text message in case of failure.
Enhanced numerical robustness of option for regressing to MMP.
Max. number of cells in Slimtube option increased to 2000. Output frequency introduced for time steps and cell numbers.
Enhanced numerical stability of saturation point option.
Regression option modified to run on Vista.
An extra datapoint was erroneously added when plotting Vrel for CME after regression.
Bug corrected in Regression option for characterized fluids. Lumping specification not always carried properly through to regression.
Plus fluid regression option modified to allow viscosity model parameters as the only tuning parameters.
Improved numerical robustness when tuning to swelling data.
Plus fluid regression erroneously changed the Peneloux parameter of CO2.
Drive type (Forward or Reverse) specification not visible for set number 5 of Multi Contact Experiment.
Saturation point option did not work for more than 1 saturation point.
Gas/oil mix ratio for Reverse Multi Contact Experiment changed to be per amount of initial oil and not amount of oil at actual stage.
Flash & Unit Operations
Improved T-dependence of H2S dissociation constant for temperatures above 70 °C.
Numerical robustness of water phase envelope algorithm option enhanced for systems with two hydrocarbon liquid phases.
Energy properties and density derivates of salt water were incorrect when calculated using Property Generator and Water Package.
Unit Operations options by mistake returned C10+ molecular weights of zero.
Flow Assurance
Hydrate H was not counted when making average energy properties.
Error corrected in Hydrate Minimum Inhibitor Option. The error appeared for mixtures with salts when more than one set of pressure-temperature values specified.
DepoWax extended with Mukherjee&Brill pressure drop model.
Bug corrected in DepoWax to enable simulation of pipes with identical inlet and ambient temperatures.
DepoWax extended to always calculate film thickness, not only in sections with wax depositing.
Hinner correlations updated in DepoWax to not include length dependent terms (these are only relevant for very short pipes with significant boundary effects).
Error corrected in DepoWax for T-derivative of the density. Marginal influence on T-profile
Unit for dP/dL corrected in DepoWax
Errors corrected in DepoWax for average viscosity of oil and water and for surface tension of gas-liquid (when water present).
Corrected made in DepoWax in calculation of heat transfer using Petukov-ESDU correlation.
Error corrected in DepoWax causing same simulation results after all time steps.
Error in thickness of laminar film corrected in DepoWax. Caused too much wax deposition.
Time step control implemented in DepoWax causing wax build-up to be almost independent of time step length.
Default Hinner correlation in DepoWax changed from Petukov-ESDU to Sieder-Tate, as the former is discontinuous in Reynold's number.
PC-SAFT available as asphaltene model for JIP sponsors as alternative to SRK/PR.
Open Structure
Open Structure Flash extended with option for calculating water properties from water package.
Error corrected in Open Structure Flash in option for specifying phase type of single-phase fluid.

Mentor Graphics Calibre 2008 license crack

Mentor Graphics Corporation (Nasdaq: MENT) today announced the availability of Calibre® xRC™ and Calibre xL rule decks for TSMC’s advanced 65nm process node. These rule decks provide advanced modeling capabilities including process sensitivity, and self and mutual inductance. Calibre now provides a solution for many types of integrated circuit designs including analog, digital, mixed signal, and memory.

For nanometer designs, accurate simulation and analysis requires more than traditional resistance and capacitance. Designers need a post-layout silicon model that incorporates inductance, process sensitivity effects, and efficient accounting of effects not captured in the device model. Using Calibre xRC and Calibre xL in the design flow helps ensure that designers have all the data they need to obtain successful first pass silicon.

“We have developed testing methodology for parasitic extraction tools to make sure we deliver accurate solutions to our customers. Calibre xRC and Calibre xL performed well in our internal tests and offers advanced modeling capabilities to capture process variation effects that are necessary for 65nm,” said Ed Wan, senior director of design services marketing, TSMC.

“Delivering accurate, complete parasitic models is an integral part of Calibre’s overall objective to improve silicon yield,” said Joe Sawicki, vice president and general manager, Design to Silicon Division, Mentor Graphics. “When coupled with Calibre LVS for device modeling, Calibre xRC and Calibre xL helps designers address parametric yield issues by accurately capturing process variation effects in device and interconnect models. Additionally, customers now have access to a full complement of inductance models with self, mutual and skin effect modeling that is necessary for today’s high frequency interconnect.”

Enabling Accurate Post-layout Functional Verification:
The New Nanometer Silicon Model
Shrinking geometries and increasing design size in the nanometer era have enabled greater functionality on a single chip. But with the increased functionality comes new complexities that create more problems in the attempt to attain design closure. This requires an electrical representation of the chip that accounts for the actual physical design of its devices and interconnect, and accurate silicon model. Calibre xRC and Calibre xL meet the demands of nanometer designs with a comprehensive approach to device and parasitic extraction to compose accurate silicon models enabling a large variety of post-layout analyses.

AVEVA PDMS 12.0 license crack

Aveva Group sells and supports its engineering software to plant and marine industries around the globe. Aveva Plant is engineering software used to design, build and operate plants of any size and complexity, the vendor said. Meanwhile, Aveva's PDMS, or plant design management system, is engineering software that uses rule-based functions to verify material information and, in turn, cut down on errors and delays.

Aveva PDMS

Aveva also offers Aveva PDMS 12 as a complement to Aveva Plant. (PDMS stands for plant design management system.) The software has a Microsoft Office-like interface and uses rule-based functions and checking tools to eliminate design errors, thus removing on-site delays due to inaccurate materials information, the vendor said. Moreover, designers can view an entire design at all times and create design databases by adding instances of parametric components from an existing catalog.

Using configurable PDMS applications, designers and managers can produce an array of reports and drawings, and hundreds of users can simultaneously work on a project. Standards-based P&ID integration eliminates errors that can result from the use of multiple authoring systems, while automatic change highlighting and tracking helps identify who has changed what in a design, Aveva said. Finally, since Aveva PDMS features a Programmable Macro Language, users can customize and automate the application as needed.
The process and power industries need powerful design applications that can be used effectively across globally distributed project teams. AVEVA PDMS delivers this proven capability, for the smallest refit or the largest green field project.
AVEVA PDMS 12 is a major new release of this world-leading product. Its upgraded technology and data structures provide a strong, extensible platform for its enhanced applications, increasing productivity, providing simple upgrade paths and making PDMS even easier to adopt.
Key Features

* Fully interactive, easy-to-use 3D design environment, with a Microsoft Office-style user interface based on .NET technology.
* Open P&ID approach consolidates P&IDs from multiple authoring systems into the PDMS database.
* Individual designers can see the entire design
at all times.
* Designers progressively construct a highly intelligent design database by placing instances of parametric components from a catalogue.
* Clash checking and configurable integrity checking rules identify errors and inconsistencies across the design.
* A wide range of reports and drawings can be produced automatically from the design database using highly configurable PDMS applications.
* Hundreds of users can work together in a fully controlled manner.
* Conventional issue and change control processes can all be applied efficiently.
* AVEVA PDMS is highly configurable and includes a powerful programmable macro language (PML) to customise the system and automate key tasks.

Lectra Romanscad v7.0 dongle crack

Lectra, the world leader in software, CAD/CAM equipment and associated services dedicated to the fashion, automotive, aerospace and furniture markets, will present its complete, integrated range dedicated to the world of footwear, luggage and leather goods at the SIMAC, FIMEC and Shoes and Leather Industry exhibitions in Bologna, Italy and Novo Hamburgo, Brazil from April 17 to 20, and Guangzhou (China) from May 30 to June 2. The latest versions of the Romans CAD Software range and the new generation of VectorFashion automated cutters, combining power with intelligence, will be on display at these events.
RomansCAD Software 2D is a powerful tool that simplifies pattern operations, promotes the expertise of the users and saves you time.
he RomansCAD Software 3D Design solution helps you meet these challenges by associating traditional skills and high-tech expertise. This tool lets you increase your creativity by drawing the style lines you want. Easy to use, it helps you simulate and offer your customers and suppliers a multitude of increasingly original models.
The RomansCAD Software 3D Last&Grade solution helps you meet your challenges by associating traditional and high-tech expertise. RomansCAD Software 3D Last&Grade is recognized by the entire profession as a high-performance tool for creating and grading 3D lasts.
o calculate quickly the consumption and cost of the materials before producing a model, you first need to know the data! The RomansCAD Software SL solution helps you meet this challenge by giving you the full results of the surface and lengths calculations with the impact on the cost of the model.
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- Romanscad 2D V7.0 contact
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- Romanscad SL V7.0 contact
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Gerber v8.3 (C) Gerber crack

Tolland, CT - Gerber Technology, a unit of Gerber Scientific, Inc. and the world leader in automated CAD/CAM and PLM solutions for the apparel and flexible materials industry, announces the release of AccuMarkversion 8.3. This update to the industry's benchmark software for pattern design, grading and marker making includes system navigation enhancements and upgrades to enhance efficiency, data integration and ease of use. Included in the update is an improved interface with its WebPDM and Fashion Lifecycle Management suite.

"Tight integration between CAD and PDM/PLM software is such an important factor in facilitating Product Lifecycle Management," said Bill Brewster, Gerber Technology's vice president of global marketing and product management. "As we focus on continuous improvements to enable our customers to maintain their competitive edge, AccuMark's interface with WebPDM and our PLM suite, Fashion Lifecycle Management, is something we're really proud of. That, combined with the other enhancements, makes this new release a valuable tool in industries including fashion where high velocity production is a must to remain competitive," he added.

In addition, Gerber Technology enhanced Pattern Wizard, one of the most popular functions within the AccuMark system. Pattern Wizard enables users of all experience levels to quickly and easily generate graded costing patterns from a library of pre-defined garment types and finished garment size specifications; it can also be used to modify existing styles, using a measurement chart. Wizards are created by the brands and emailed to the global suppliers to control the quality of the styles being created offshore and to ensure their standard patterns are created correctly and to specification.

AccuMark V8.3 supports both SQL Server 2005 and SQL Server Express 2005. SQL Server Express 2005 is included with the AccuMark software, free of charge, so that companies can be introduced to the benefits of SQL without having to purchase Server 2005. SQL Server Express provides users with better access to statistical data from their AccuMark systems and allows users to run database applications on desktops and small servers.

When combined with AccuMark V8.3, SQL Server 2005 provides users with increased levels of data security, user-level controls of access to data, and more robust user access to data on large networks of AccuMark systems. As the top choice in enterprise databases, SQL Server 2005 facilitates communication between the AccuMark and other ERP systems, providing easier access to the AccuMark data for querying, scheduling or even remote processing of data.

"AccuMark version 8.3 allows users to make the most of their time and resources. By listening to our customers, we continue to innovate by expanding the features to meet customer needs for both speed and cost reduction," said Angela Cruz, product manager, AccuMark family products, Gerber Technology. "We are really pleased to see this product continue to evolve and to be the leading choice of so many in the industry."

Currently available in more than 20 languages, AccuMark is the standard for pattern design, grading and marker making/nesting in the apparel, transportation interiors, furniture and industrial fabrics industries. AccuMark software is used by more than 13,000 customers worldwide, with more than 38,000 seats installed.

Customers with Software Subscription Contracts can download Version 8.3 free of charge from GERBERnet, the company's Internet-based customer service portal for software updates, replacement parts ordering and comprehensive technical documentation. Access to GERBERnet is provided via www.gerbertechnology.com. Software Subscription Contracts also offer users access to call centers around the world for further technical assistance

2009.01 0day softwares

2009-01-30 Algor.FEA.v23.SP2
2009-01-30 CAEFEM.v9.3
2009-01-29 CMG SUITE V2008.10
2009-01-29 Siemens PLM FEMAP 10.0
2009-01-29 ALGOR.Designcheck.v23.0.SP2
2009-01-29 Tessel.CADRaster.Pro.v9.1.for.Autocad
2009-01-28 LMS.VIRTUAL.LAB.REV8A.SL1.32BIT
2009-01-26 SOLIDWORKS.V2009.SP.2.0.MULTILANGUAGE.UPDATE
2009-01-25 Dassault.Systemes.CATIA.v5R19.incl.SP3.MULTiLANGUAGE
2009-01-25 BASIS.BBj.Barista.Enterprise.v8.31
2009-01-24 LANTEK.V27
2009-01-24 Mastercam.X3.Maintenance.Update.1 crackfix
2009-01-23 Safe.Software.FME.Desktop.v2009.5660
2009-01-22 GS.AFES.v3.0.012109
2009-01-22 VAG.ElsaWin.v3.60.MULTiLANGUAGE
2009-01-21 Bentley.PowerMap.XM.v08.09.04.84
2009-01-21 Bentley.InRoads.Suite.XM.Edition.v8.09.03.06
2009-01-21 Bentley.InRoads.Suite.v8i.XM.v8.11.05.47
2009-01-21 Bentley.Civil.Extension.For.InRoads.XM.v8.09.03.06
2009-01-20 ESI.ADVANCED.CFD.V2008.2
2009-01-20 DELCAM.FEATURECAM.2009.V15
2009-01-19 Bentley.ProSteel.V8i.for.AutoCAD.2004-2009.v19.11.08.MULTiLANGUAGE
2009-01-18 CEI.EnSight.Gold.v9.0 for win &Linux
2009-01-18 CambridgeSoft.ChemBioOffice.WorkGroup.Ultra.2009.v11.0.2
2009-01-17 Virtual.NanoLab.v2008.10
2009-01-17 Atomistix.Toolkit.v2008.10
2009-01-16 Autodesk.Robot.Structural.Analysis.Professional.v2009
2009-01-15 Autodsys.AcceliCAD2CAM.2009.v6.4.23.3A
2009-01-14 Spark-Space.Professional.v4.0.0015
2009-01-13 Pointwise.v16.02.R1
2009-01-12 Nemetschek_Allplan_BIM_v2008.0e_MULTiLANGUAGE
2009-01-12 Molecular.Operating.Environment.v2008.10
2009-01-11 MOSEK.Optimization.Tools.v5.0.105
2009-01-10 PLANIT EDGECAM V2009 R1
2009-01-10 NCSS.with.GESS.2007.v7.1.14
2009-01-09 Think3.ThinkDesign.v2008.1.build.107.78.MULTILANGUAGE
2009-01-08 IMPROVISION_VOLOCITY_V5.0.2
2009-01-08 LMS.TEST.LAB.V8B
2009-01-07 Telelogic.Rhapsody.v7.4.1005738.Windows
2009-01-07 ICEM.Surf.v4.8.0
2009-01-07 Aquaveo.GMS.v6.5.3
2009-01-06 Eon.Vue.7_xStream.X86.X64
2009-01-05 Molecular.Operating.Environment.v2008.10
2009-01-04 SOFTWARE_CRADLE_SC_TETRA_V7
2009-01-04 TEKLA.STRUCTURES.V14.1
2009-01-04 PLEINAIR.PAINTING.THE.AMERICAN.LANDSCAPE
2009-01-02 Aquaveo.SMS.v10.0.10
2009-01-02 Aquaveo.WMS.v8.1.120508
2009-01-02 CSI.ETABS.NL.V9.5.0
2009-01-02 AUTODESK.IMPRESSION.V2.0.21973
2009-01-01 Bentley.Structural.V8i.XM.v8.11.05.25
2009-01-01 Bentley.Revit.Plugin.V8i.XM.v8.11.05.26
2009-01-01 Bentley.Microstation.Descartes.V8i.XM.v8.11.05.25
2009-01-01 Dowell.Systems.Automotive.Expert.v7.85
2009-01-01 Geometric.GeomCaliper.for.CATIA.V5.R2.3
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